In following figure, how to reduce significant unintentional exposure or proximi

Question

In following figure, how to reduce significant unintentional exposure or proximity effect? The center of the large pad receives a higher dose than nominal, and the isolated line at the right receives a lower dose. The center of the large pad receives a higher dose than nominal, and the isolated line at the right receives a larger dose. The center of the large pad receives a lower dose than nominal, and the isolated line at the right receives a larger dose. The center of the large pad receives a lower dose than nominal, and isolated line at the right receives a larger dose. Choose two characteristics of electron-beam lithography? High resolution High throughput Low throughput Low resolution. Vacuum Which following is rough vacuum pump? Diffusion pump Rotary vane pump Turbo pump Cryopump Which two following pumps have back backstreaming problems? Turbo pump Rotary vane pump Diffusion pump Cryo pump Which following pump can provide high vacuum of 10^-6 torr? Rotary vane pump Turbo pump Roots blower

Explanation / Answer

f) The Center of Large Pad receives higher dose and isolated lne at the right receives a larger dose.

g) E Beam Lithography provides Higher resolution

h) Rotary Vane Pump

i) Rotary Vane Pump

j) Turbo Pump.

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